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Fast and easy fabrication methodology of Fresnel zone plates for the extreme ultraviolet and soft x-ray regions
Applied optics 58(4), 1057-1063 () [10.1364/AO.58.001057]  GO BibTeX | EndNote: XML, Text | RIS

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Spatially Resolved Spectroscopic Extreme Ultraviolet Reflectometry for Laboratory Applications
Journal of nanoscience and nanotechnology 19(1), 562-567 () [10.1166/jnn.2019.16470]  GO BibTeX | EndNote: XML, Text | RIS

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Structural properties of templated Ge quantum dot arrays : impact of growth and pre-pattern parameters
Nanotechnology 29(27), 275601 () [10.1088/1361-6528/aabf07]  GO BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Dissertation / PhD Thesis
Magnetic properties of self-assembled manganese oxide and iron oxide nanoparticles : Spin structure and composition
Aachen 1 Online-Ressource (ii, 178 Seiten) : Illustrationen () [10.18154/RWTH-2018-225134] = Dissertation, RWTH Aachen University, 2018  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Manipulation of magnetism in iron oxide nanoparticle : BaTiO3 composites and low-dimensional iron oxide nanoparticle arrays
Aachen 1 Online-Ressource (151 Seiten) : Illustrationen () [10.18154/RWTH-2018-224511] = Dissertation, RWTH Aachen University, 2018  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Extreme ultraviolet reflectometry for structural and optical characterization of thin films and layer systems
Aachen 1 Online-Ressource (vi, 106 Seiten) : Illustrationen, Diagramme () [10.18154/RWTH-2018-221598] = Dissertation, RWTH Aachen, 2018. - Dissertation, Università degli Studi di Padova, 2018  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Studies on laser-triggered discharge plasmas as extreme ultraviolet light sources
Aachen 1 Online-Ressource (xxii, 223 Seiten) : Illustrationen, Diagramme () [10.18154/RWTH-2017-08541] = Dissertation, RWTH Aachen University, 2017  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Dissertation / PhD Thesis
Development and metrology of extreme ultraviolet and soft x-ray multilayer mirrors
Aachen 1 Online-Ressource (IX, 105 Seiten) : Illustrationen, Diagramme () [10.18154/RWTH-2016-05680] = Dissertation, RWTH Aachen University and Padova University, 2016  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Ptychographic imaging with partially coherent plasma EUV sources
Advanced Optical Technologies 6(6), 459-466 () [10.1515/aot-2017-0050]  GO  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Dissertation / PhD Thesis
Interface phenomena in La$_{1/3}$Sr$_{2/3}$FeO$_3$ / La$_{2/3}$Sr$_{1/3}$MnO$_3$ heterostructures and a quest for p-electron magnetism
Aachen 1 Online-Ressource (ix, 205 Seiten) : Illustrationen, Diagramme () [10.18154/RWTH-2017-09738] = Dissertation, RWTH Aachen University, 2017  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Dissertation / PhD Thesis
Realisierung eines hochauflösenden EUV-Mikroskops mit einer optimierten Gasentladungsquelle zum Betrieb mit Wellenlängen um 17 nm zur Mikroskopie an M-Kanten von Elementen
Aachen 193 Blätter : Illustrationen, Diagramme () = Dissertation, RWTH Aachen University, 2017 BibTeX | EndNote: XML, Text | RIS

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Kohärente Beugungsmikroskopie mit Laborlichtquellen
Aachen 1 Online-Ressource (xx, 210 Seiten) : Illustrationen, Diagramme () [10.18154/RWTH-2017-05229] = Dissertation, RWTH Aachen University, 2017  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Dissertation / PhD Thesis
Interference lithography with extreme ultraviolet light
Aachen 1 Online-Ressource (149 Seiten) : Illustrationen, Diagramme () [10.18154/RWTH-2017-02814] = Dissertation, RWTH Aachen University und University of Southampton, 2016  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Contribution to a book
Table-top EUV scatterometer MARYS with high-brightness discharge plasma source
JARA-FIT annual report. - 2015 Jülich : Forschungszentrum, JARA-FIT annual report 2015, 149-150 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Ptychographic imaging with a tin plasma based EUV light source
JARA-FIT annual report. - 2015 Jülich : Forschungszentrum, JARA-FIT annual report 2015, 147-148 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy
JARA FIT Annual Report 2015 Jülich : Forschungszentrum, JARA-FIT annual report 2015, 151-152 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis
Journal of micro/nanolithography, MEMS and MOEMS 15(4), 043502 () [10.1117/1.JMM.15.4.043502]  GO BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Dissertation / PhD Thesis
Magnetic interface effects in thin film heterostructures
Aachen 1 Online-Ressource (XI, 187 Seiten) : Illustrationen, Diagramme () = Dissertation, RWTH Aachen, 2015 OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Wide-field broadband extreme ultraviolet transmission ptychography using a high-harmonic source
Optics letters 41(7), 1317-1320 () [10.1364/OL.41.001317]  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Wide-field broadband extreme ultraviolet transmission ptychography using a high-harmonic source: publisher’s note
Optics letters 41(13), 3057-3057 () [10.1364/OL.41.003057]  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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High Resolution, Wide Field of View, Ptychographic Imaging of a Biological Sample using a High Harmonic Generation Source
[CLEO: Science and Innovations, 05.06.2016-10.05.2016, San Jose, Calif., USA]
Conference on Lasers and Electro-Optics, CLEO, San Jose, Calif.San Jose, Calif., USA, 5 Jun 2016 - 10 Jun 20162016-06-052016-06-10
Washington, D.C. : OSA () [10.1364/CLEO_SI.2016.SF1I.4]  GO BibTeX | EndNote: XML, Text | RIS

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Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Applied physics express 9(7), 076701 () [10.7567/APEX.9.076701]  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Freeform lens collimating spectrum-folded Hadamard transform near-infrared spectrometer
Optics communications 380, 161-167 () [10.1016/j.optcom.2016.06.009]  GO BibTeX | EndNote: XML, Text | RIS

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Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy
Applied physics letters 108(23), 234101 () [10.1063/1.4953071]  GO BibTeX | EndNote: XML, Text | RIS

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Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering
Journal of physics / D, Applied physics 49(22), 225201 () [10.1088/0022-3727/49/22/225201]  GO BibTeX | EndNote: XML, Text | RIS

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Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths
Journal of applied physics 119(9), 095301 () [10.1063/1.4942656]  GO BibTeX | EndNote: XML, Text | RIS

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Single Exposure Imaging of Talbot Carpets and Resolution Characterization of Detectors for Micro- and Nano- Patterns
Journal of the Optical Society of Korea : JOSK 20(2), 245-250 () [10.3807/JOSK.2016.20.2.245]  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
IEEE photonics journal 8(3), 2600209 () [10.1109/JPHOT.2016.2553847]  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Enabling laboratory EUV research with a compact exposure tool
[Extreme Ultraviolet (EUV) Lithography VII / Editors: Eric M. Panning, Kenneth A. Goldberg]
SPIE Advanced Lithography, San Jose, CaliforniaSan Jose, California, USA, 21 Feb 2016 - 25 Feb 20162016-02-212016-02-25
Bellingham, Wash. : SPIE, Proceedings of SPIE 9776, 19 Seiten () [10.1117/12.2219164]  GO BibTeX | EndNote: XML, Text | RIS

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Coherent Diffractive Imaging with a Laboratory-Scale, Gas-Discharge Plasma Extreme Ultraviolet Light Source; 1st ed. 2016
X-ray lasers 2014 : proceedings of the 14th International Conference on X-Ray Lasers / Jorge Rocca; Carmen Menoni; Mario Marconi, eds.
14th International Conference on X-Ray Lasers, ICXRL 2014, Fort Collins, COFort Collins, CO, USA, 26 May 2014 - 30 May 20142014-05-262014-05-30
Cham ; s.l. : Springer International Publishing ; Imprint: Springer, Springer Proceedings in Physics 169, : 1st ed. 2016, 275-280 () [10.1007/978-3-319-19521-6_36]  GO BibTeX | EndNote: XML, Text | RIS

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Lensless Proximity EUV Lithography with a Xenon Gas Discharge Plasma Radiation; 1st ed. 2016
X-ray lasers 2014 : proceedings of the 14th International Conference on X-Ray Lasers / Jorge Rocca; Carmen Menoni; Mario Marconi, eds.
14th International Conference on X-Ray Lasers, ICXRL 2014, Fort Collins, COFort Collins, CO, USA, 26 May 2014 - 30 May 20142014-05-262014-05-30
Cham ; s.l. : Springer International Publishing ; Imprint: Springer, Springer Proceedings in Physics 169, : 1st ed. 2016, 313-319 () [10.1007/978-3-319-19521-6_41]  GO BibTeX | EndNote: XML, Text | RIS

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Dissertation / PhD Thesis
Strain and electric field mediated manipulation of magnetism in La$_{(1-x)}$Sr$_x$MnO$_3$/BaTiO$_3$ heterostructures
Aachen 1 Online-Ressource (VI, 141 Seiten) : Illustrationen () = Dissertation, RWTH Aachen, 2015 OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Ptychographic imaging with a compact gas–discharge plasma extreme ultraviolet light source
Optics letters 40(23), 5574-5577 () [10.1364/OL.40.005574]  GO  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Ultra-broadband ptychography with self-consistent coherence estimation from a high harmonic source
X-ray lasers and coherent x-ray sources: development and applications XI : 12 - 13 August 2015, San Diego, California, USA ; [part of SPIE optics + photonics] / sponsored and publ. by SPIE. Annie Klisnick ..., ed.
X-Ray Lasers and Coherent X-Ray Sources: Development and Applications Conference, San Diego, Calif.San Diego, Calif., USA, 9 Aug 2015 - 13 Aug 20152015-08-092015-08-13
Bellingham, Wash. : SPIE, Proceedings of SPIE 9589, 958912, 8 Seiten () [10.1117/12.2188166]  GO BibTeX | EndNote: XML, Text | RIS

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Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges
Applied optics 54(35), 10351-10358 () [10.1364/AO.54.010351]  GO BibTeX | EndNote: XML, Text | RIS

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Generation of circularly polarized radiation from a compact plasma-based EUV light source for tabletop X-ray magnetic circular dichroism studies
Annual Report / JARA-FIT, Jülich Aachen Research Alliance for Fundamentals of Future Information Technology. - 2014 Jülich : JARA-FIT, Jülich Aachen Research Alliance for Fundamentals of Future Information Technology, Annual Report / JARA-FIT, Jülich Aachen Research Alliance for Fundamentals of Future Information Technology 2014, 113-114 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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A phase retrieval algorithm based on three-dimensionally translated diffraction patterns55 S.)
epl : a letters journal exploring the frontiers of physics 111(6), 64002 () [10.1209/0295-5075/111/64002]  GO BibTeX | EndNote: XML, Text | RIS

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Optical properties of 2D fractional Talbot patterns under coherent EUV illumination
Journal of physics / D 48(37), 375101 () [10.1088/0022-3727/48/37/375101]  GO BibTeX | EndNote: XML, Text | RIS

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Optical and structural characterization of CeO2/B4C multilayers near boron K-edge energy
EUV and X-ray optics: synergy between laboratory and space IV : 13 - 14 April 2015, Prague, Czech Republic ; [part of SPIE optics + optoelectronics] / sponsored by SPIE. René Hudec ..., ed.
EUV and X-ray Optics: Synergy between Laboratory and Space IV, PraguePrague, Czech Republic, 13 Apr 2015 - 16 Apr 20152015-04-132015-04-16
Bellingham, Wash. : SPIE, Proceedings of SPIE 9510, 95100, 12 S. () [10.1117/12.2181820]  GO BibTeX | EndNote: XML, Text | RIS

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Irradiation of low energy ions damage analysis on multilayers
Damage to VUV, EUV, and X-ray optics V : 15 - 16 April 2015, Prague, Czech Republic ; [part of SPIE optics + optoelectronics] / sponsored by SPIE. Libor Juha ..., ed.
Conference on Damage to VUV, EUV, and X-ray Optics V, PraguePrague, Czech Republic, 13 Apr 2015 - 16 Apr 20152015-04-132015-04-16
Bellingham, Wash. : SPIE, Proceedings of SPIE 9511, 95110P, 8 S. () [10.1117/12.2181821]  GO BibTeX | EndNote: XML, Text | RIS

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Employing partially coherent, compact gas-discharge sources for coherent diffractive imaging with extreme ultraviolet light
X-ray lasers and coherent x-ray sources: development and applications XI : 12 - 13 August 2015, San Diego, California, USA ; [part of SPIE optics + photonics] / sponsored and publ. by SPIE. Annie Klisnick ..., ed.
X-Ray Lasers and Coherent X-Ray Sources: Development and Applications Conference, San Diego, CASan Diego, CA, USA, 9 Aug 2015 - 13 Aug 20152015-08-092015-08-13
Bellingham, Wash. : SPIE, Proceedings of SPIE 9589, 95890L () [10.1117/12.2187852]  GO BibTeX | EndNote: XML, Text | RIS

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Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
Optics express 23(20), 25487-25495 () [10.1364/OE.23.025487]  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Nanophotonic applications of fs-laser radiation induced nanostructures and their theoretical description
Optically induced nanostructures : biomedical and technical applications / ed. by Karsten König and Andreas Ostendorf Berlin ; Boston, Mass : de Gruyter 25-46 () [10.1515/9783110354324-006]  GO OpenAccess  Download fulltext Files BibTeX | EndNote: XML, Text | RIS

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Table-Top EUV and Soft X-Ray Microscopy
Imaging & microscopy 2015(May 26), 3 S. ()  GO   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Multi-angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces
Spring Meeting – Symposium H: ALTECH 2014, E-MRS 2014, LilleLille, France, 26 May 2014 - 30 May 20142014-05-262014-05-30 Physica status solidi / C 12(3), 318-322 () [10.1002/pssc.201400117] special issue: "E-MRS 2014 Spring Meeting – Symposium H: ALTECH 2014 : [ Analytical techniques for precise characterization of nanomaterials]"  GO BibTeX | EndNote: XML, Text | RIS

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Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light sourceeuv
Optics letters 40(12), 2818-2821 () [10.1364/OL.40.002818]  GO BibTeX | EndNote: XML, Text | RIS

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Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope
Extreme Ultraviolet (EUV) Lithography VI / Obert R. Wood; Eric M. Panning
Extreme Ultraviolet (EUV) Lithography VI, San Jose, CASan Jose, CA, USA, 23 Feb 2015 - 26 Feb 20152015-02-232015-02-26
Bellingham, Wash. : SPIE, Proceedings of SPIE 9422, 942229 pp. () [10.1117/12.2085929]  GO BibTeX | EndNote: XML, Text | RIS

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Fractional Talbot lithography with extreme ultraviolet light
Optics letters 30(24), 6969-6972 () [10.1364/OL.39.006969]  GO BibTeX | EndNote: XML, Text | RIS

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Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies
Review of scientific instruments : RSI 85(10), 103110 () [10.1063/1.4897491]  GO BibTeX | EndNote: XML, Text | RIS

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Laser triggered Z-pinch broadband extreme ultraviolet source for metrology
Applied physics letters 102(20), 203504 () [10.1063/1.4807172]  GO BibTeX | EndNote: XML, Text | RIS

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Tabletop coherent diffraction imaging with a discharge plasma EUV source
X-ray lasers and coherent x-ray sources: development and applications X : 27 - 29 August 2013, San Diego, California, USA ; [part of SPIE optics + photonics] / sponsored and publ. by SPIE. Annie Klisnick ..., ed.. - 8849 Berlin ; Offenbach : VDE-Verl. 8849 0Y () [10.1117/12.2023895]  GO BibTeX | EndNote: XML, Text | RIS

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Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
Journal of micro/nanolithography, MEMS and MOEMS 12(3), 033002 () [10.1117/1.JMM.12.3.033002]  GO BibTeX | EndNote: XML, Text | RIS

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Imaging with plasma based extreme ultraviolet sources
Short-wavelength imaging and spectroscopy sources : 10 - 11 September 2012, Bern, Switzerland / organized by David Bleiner, Institute for Applied Physics, University of Bern (Switzerland) Bellingham, Wash. : SPIE, Proceedings of SPIE 8678, 8678 0F () [10.1117/12.2011139]  GO BibTeX | EndNote: XML, Text | RIS

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Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays
Journal of vacuum science & technology : JVST / B 31(2), 021602 () [10.1116/1.4789445]  GO BibTeX | EndNote: XML, Text | RIS

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Broadband transmission masks, gratings and filters for extreme ultaviolet and soft X-ray lithography
Thin solid films 520(15), 5080-5085 () [10.1016/j.tsf.2012.03.036]  GO BibTeX | EndNote: XML, Text | RIS

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Cross characterization of ultrathin interlayers in HfO2 high-k stacks by angle resolved x-ray photoelectron spectroscopy, medium energy ion scattering, and grazing incidence extreme ultraviolet reflectometry
Journal of vacuum science & technology / A, Vacuum, surfaces, & films 30(4), 041506 () [10.1116/1.4718433]  GO BibTeX | EndNote: XML, Text | RIS

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Quantum efficiency determination of a novel CMOS design for fast imaging applications in the extreme ultraviolet
IEEE transactions on electron devices : ED 59(3), 846-849 () [10.1109/TED.2011.2177838]  GO BibTeX | EndNote: XML, Text | RIS

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Gateable micro channel plate detector for extreme ultraviolet radiation with high temporal resolution
JARA FIT Jülich Aachen Research Alliance for Fundamentals of Future Information Technologies : Annual Report 2011 / Eds.: Wolfgang Speier, Matthias Wuttig, Detlev Grützmacher Jülich [u.a.] : Forschungszentrum Jülich ; RWTH Aachen University 145-146 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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EUV dark-field microscopy for defect inspection
The 10th international conference on X-ray microscopy : Chicago, Illinois, USA 15 – 20 August 2010 / ed by SIan McNulty ... Sponsoring organizations: U.S. Department of Energy ... Melville, N. Y. : AIP, AIP Conference Proceedings 1365, 265-268 () [10.1063/1.3625355]  GO BibTeX | EndNote: XML, Text | RIS

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Time resolved EUV pump-probe microscopy of fs-LASER induced nanostructure formation
EUV and x-ray optics: synergy between laboratory and space : 20 - 21 April 2011, Prague, Czech Republic ; [papers presented at the SPIE Europe Conference on EUV and X-Ray Optics: Synergy between Laboratory and Space at SPIE optics + optoelectronics] / sponsored and publ. by SPIE. René Hudec ..., ed. Bellingham, Wash. : SPIE, Proceedings of SPIE 8076, 80760K, 7 S. () [10.1117/12.886872]  GO BibTeX | EndNote: XML, Text | RIS

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Performance benchmark of a gateable microchannel plate detector for extreme ultraviolet radiation with high temporal resolution
EUV and x-ray optics: synergy between laboratory and space : 20 - 21 April 2011, Prague, Czech Republic ; [papers presented at the SPIE Europe Conference on EUV and X-Ray Optics: Synergy between Laboratory and Space at SPIE optics + optoelectronics] / sponsored and publ. by SPIE. René Hudec ..., ed. Bellingham, Wash. : SPIE, Proceedings of SPIE 8076, 80760R, 7 S. () [10.1117/12.887017]  GO BibTeX | EndNote: XML, Text | RIS

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EUV actinic mask blank defect inspection: results and status of concept realization
27th European Mask and Lithography Conference : 18 - 19 January 2011, Dresden, Germany / organized by VDE/VDI GMM - the Society for Microelectronics, Micro- and Precision Engineering (Germany). Uwe F. W. Behringer, ed. Bellingham, Wa. : SPIE, Proceedings of SPIE 7985, 79850C, 8 S. () [10.1117/12.896890]  GO BibTeX | EndNote: XML, Text | RIS

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Actinic EUV-Mask metrology: tools, concepts, components
27th European Mask and Lithography Conference : 18 - 19 January 2011, Dresden, Germany / organized by VDE/VDI GMM - the Society for Microelectronics, Micro- and Precision Engineering (Germany). Uwe F. W. Behringer, ed. Bellingham, Wa. : SPIE, Proceedings of SPIE 7985, 79850-B, 6 S. () [10.1117/12.896266]  GO BibTeX | EndNote: XML, Text | RIS

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Self-organized MBE growth of Ge quantum dots directed by extreme ultraviolet interference lithography
JARA FIT Jülich Aachen Research Alliance for Fundamentals of Future Information Technologies. Annual Report 2010. Eds.: Wolfgang Speier, Markus Morgenstern, Detlev Grützmacher Jülich [u.a.] : Forschungszentrum Jülich ; RWTH Aachen University 43-44 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Spectral sharpening algorithm for a polychromatic reflectometer in the extreme ultraviolet
Applied spectroscopy 64(4), 401-408 ()  GO   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Defect Inspection with an EUV Microscope
26th European Mask and Lithography Conference : 18 - 20 January 2010, Grenoble, France / organized by VDE/VDI GMM - the Society for Microelectronics, Micro- and Precision Engineering (Germany). Uwe F. W. Behringer, ed. Bellingham, Wash. : SPIE, Proceedings of SPIE 7545, 49008 pp. () [10.1117/12.863818]  GO BibTeX | EndNote: XML, Text | RIS

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Contributions to EUV mask metrology infrastructure
26th European Mask and Lithography Conference : 18 - 20 January 2010, Grenoble, France / organized by VDE/VDI GMM - the Society for Microelectronics, Micro- and Precision Engineering (Germany). Uwe F. W. Behringer, ed. Bellingham, Wash. : SPIE, Proceedings of SPIE 7545, 75450K, 5 S. () [10.1117/12.865780]  GO BibTeX | EndNote: XML, Text | RIS

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EUV-pump-probe microscopy of FS-Laser induced nano-structure formation
Congress proceedings / ICALEO, 29th International Congress on Applications of Lasers & Electro-Optics : September 26 - 30, 2010, Anaheim, CA, USA, Anaheim Marriot ; [including] Laser Materials Processing Conference, Laser Microprocessing Conference, Nanomanufacturing Conference / presented by: Laser Institute of America. Congress general chair: Xinbing Liu Orlando, Fla. : LIA, Laser Institute of America, LIA Pub 613 = 103, N107, 4 S. () BibTeX | EndNote: XML, Text | RIS

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EUV dark-field microscopy for nanoscale defect inspection
JARA FIT Jülich Aachen Research Alliance for Fundamentals of Future Information Technologies : Annual Report 2009 / Eds.: Wolfgang Albrecht, Markus Morgenstern, Detlev Grützmacher Jülich [u.a.] : Forschungszentrum Jülich ; RWTH Aachen University 91-92 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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High effenciency transmission masks for XUV nanostructuring and interference lithography
JARA FIT Jülich Aachen Research Alliance for Fundamentals of Future Information Technologies : Annual Report 2009 / Eds.: Wolfgang Albrecht, Markus Morgenstern, Detlev Grützmacher Jülich [u.a.] : Forschungszentrum Jülich ; RWTH Aachen University 43-44 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm
Journal of applied physics 106(7), 073309 () [10.1063/1.3243287]  GO BibTeX | EndNote: XML, Text | RIS

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Table-top reflectometer in the extreme ultraviolet for surface sensitive analysis
Applied physics letters 94(6), 063507 () [10.1063/1.3079394]  GO BibTeX | EndNote: XML, Text | RIS

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EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
9th Internatinal Conference on X-Ray Microscopy : 21-25 July 2008, Zürich, Switzerland Bristol : IOP Publ., Journal of Physics / Conference series 186, 012030, 3 S. () [10.1088/1742-6596/186/1/012030]  GO OpenAccess BibTeX | EndNote: XML, Text | RIS

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Line image sensors for spectroscopic applications in the extreme ultraviolet
Measurement science and technology 20(10), 105201 () [10.1088/0957-0233/20/10/105201]  GO BibTeX | EndNote: XML, Text | RIS

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XUV metrology: Surface analysis with Extreme Ultraviolet Radiation
Damage to VUV, EUV, and x-ray optics II : 21 - 23 April 2009, Prague, Czech Republic / sponsored by SPIE Europe. Libor Juha ..., ed. Bellingham, Wa. : SPIE, Proceedings of SPIE 7361, 736113, 12 S. () [10.1117/12.833648]  GO BibTeX | EndNote: XML, Text | RIS

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Two magnification steps EUV microscopy with a Schwarzschild objective and an adapted zone plate lens
EUV and X-Ray Optics: Synergy between Laboratory and Space, Monday 20 April 2009, Prague, Czech Republic Bellingham, Wash : SPIE, Proceedings of SPIE 7360, 736005, 8 S. () [10.1117/12.822986]  GO BibTeX | EndNote: XML, Text | RIS

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Characterization of ultra-thin layers in MOS-devices with XUV reflectometry
Annual Report '08 : JARA FIT ; Jülich Aachen Research Alliance for Fundamentals of Future Information Technology / Forschungszentrum Jülich. RWTH Aachen University. M. Morgenstern ; D. Grützmacher Jülich [u.a.] : Forschungszentrum [u.a.] 47-48 () BibTeX | EndNote: XML, Text | RIS

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XUV interference lithography for sub-10 nm patterning
Annual Report '08 : JARA FIT ; Jülich Aachen Research Alliance for Fundamentals of Future Information Technology / Forschungszentrum Jülich. RWTH Aachen University. M. Morgenstern ; D. Grützmacher Jülich [u.a.] : Forschungszentrum [u.a.] 49-50 () BibTeX | EndNote: XML, Text | RIS

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Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources
Advances in x-ray/EUV optics and components III : 11 - 13 August 2008, San Diego, California, USA / sponsored and publ. by SPIE. Ali M. Khounsary ..., ed. Bellingham, Wash. : SPIE, Proceedings of SPIE 7077, 707714, 10 S. () [10.1117/12.793364]  GO BibTeX | EndNote: XML, Text | RIS

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Extreme ultraviolet lithography
Nanotechnology / G. Schmid, ... (Eds.). - Vol. 3.: Information technology. - 1 / ed. by Rainer Waser Weinheim : Wiley-VCH 181-208 () BibTeX | EndNote: XML, Text | RIS

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EUV light sources; 2., rev. and enl. ed..
Low temperature plasmas : fundamentals, technologies and techniques / ed. by Rainer Hippler .... - Vol. 2 Weinheim : Wiley-VCH : 2., rev. and enl. ed.., 619-654 () BibTeX | EndNote: XML, Text | RIS

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Mit weicher Röntgenstrahlung hochgenau messen; Als Ms. gedr.
Optische Messung technischer Oberflächen in der Praxis : Bestimmung von Geometrie und Topographie ; Tagung Hannover, 9. und 10. Oktober 2007 / VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik Düsseldorf : VDI-Verl., VDI-Berichte 1996, : Als Ms. gedr., 329-337 () BibTeX | EndNote: XML, Text | RIS

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Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography
Journal of physics / D, Applied physics 37(23), 3213-3224 () [10.1088/0022-3727/37/23/002]  GO BibTeX | EndNote: XML, Text | RIS

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Compact laboratory EUV-lamps : 'In-house beamlines' for technologies based on extreme ultraviolet radiation
MicroNano integration : [International Forum on MicroNano Integration, held in Potsdam, Germany on December 3 - 4, 2003] / Harald Knobloch; Yvette Kaminorz (ed.) Berlin [u.a.] : Springer, VDI-Buch 259-261 () BibTeX | EndNote: XML, Text | RIS

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Extreme ultraviolet radiation from pulsed discharges : a new access to 'nanoscopy' and 'Nanolytics'
MicroNano integration : [International Forum on MicroNano Integration, held in Potsdam, Germany on December 3 - 4, 2003] / Harald Knobloch; Yvette Kaminorz (ed.) Berlin [u.a.] : Springer, VDI-Buch 169-184 ()   Download fulltextFulltext BibTeX | EndNote: XML, Text | RIS

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Pinch plasma radiation sources for the extreme ultraviolet
Contributions to plasma physics : CPP 41(6), 589-597 () [10.1002/1521-3986(200111)41:6<589::AID-CTPP589>3.0.CO;2-Z] special issue: "[German Federal Topical Conference on Plasma Technology, FEB 28-MAR 02, 2001, GREIFSWALD, GERMANY]"  GO BibTeX | EndNote: XML, Text | RIS